home › resources & publications › laser processing of amorphous silicon for polysilicon devices, circuits and flat-panel imagers
TECHNICAL PUBLICATIONS:
Laser processing of amorphous silicon for polysilicon devices, circuits and flat-panel imagers
- Proceedings of the Materials Society
citation
Boyce, J. B. ; Fulks, R. T. ; Ho, J. H. ; Lau, R. K. ; Lu, J. P. ; Mei, P. ; Street, R. A. ; Van Schuylenbergh, K. ; Wang, Y. Laser processing of amorphous silicon for polysilicon devices, circuits and flat-panel imagers. Amorphous and Heterogeneous Silicon Thin Films - 2000; Materials Research Society Symposium Proceedings; 2000 April 24-28; San Francisco, CA. Warrendale, PA: MRS; 2001; 609: A31.4.1-12.
PARC authors
related publications
Flat panel imagers based on excimer laser annealed, poly-Si thin film transistor technology
Laser proccessing of amorphous silicon for large area polysilicon electronics
Laser processing of amorphous silicon for large area polysilicon imagers
Laser processing for amorphous Si air-gap TFTs
Flat panel imagers with pixel level amplifiers based on poly-Si thin film transistor technology
Large area electronics for flat panel imagers - progress and challenges
