Effect of helium dilution during plasma-enhanced deposition on electron trapping in silicon dioxide thin films

• Applied Physics Letters

citation

Park, Y. C.; Johnson, N. M.; Jackson, W. B.; Stevens, K. S.; Smith, D. L.; Hagstrom, S. B. Effect of helium dilution during plasma-enhanced deposition on electron trapping in silicon dioxide thin films. Applied Physics Letters. 1992; 60 (6): 695-697.