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Kinetics of gas-phase chemical reactions and growth of a-SiC:H films from silane and acetylene in a remote hydrogen plasma reactor

 
 
citation

Johnson, N. M.; Santos, P. V.; Walker, J.; Stevens, K. S. Kinetics of gas-phase chemical reactions and growth of a-SiC:H films from silane and acetylene in a remote hydrogen plasma reactor. Amorphous Silicon Technology--1991, Materials Research Society Symposium Proceedings Series, vol. 219, edited by A. Madan, Y. Hamakawa, M. J. Thompson, P. C. Taylor, and P. G. LeComber. Warrendale, PA: Materials Research Society; 1991; 703-708.