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Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor

 
 
citation

Johnson, N. M.; Santos, P. V.; Nebel, C. E.; Jackson, W. B.; Street, R. A.; Stevens, K. S.; Walker, J. Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor. Journal of Non-Crystalline Solids. 1991; 137-138: 235-238.