Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor

• Journal of Non-Crystalline Solids

citation

Johnson, N. M.; Santos, P. V.; Nebel, C. E.; Jackson, W. B.; Street, R. A.; Stevens, K. S.; Walker, J. Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor. Journal of Non-Crystalline Solids. 1991; 137-138: 235-238.