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Stability of a-Si:H thin films deposited at high temperatures with a remote hydrogen plasma

 
 
citation

Johnson, N. M.; Nebel, C. E.; Santos, P. V.; Jackson, W. B.; Street, R. A.; Stevens, K. S.; Walker, J. Stability of a-Si:H thin films deposited at high temperatures with a remote hydrogen plasma. Applied Physics Letters. 1991 September 16; 59 (12): 1443-1445.