Measurement of intrinsic stress in a-Si:H thin films deposited in a remote hydrogen plasma reactor

• Amorphous Silicon Technology--1991, Materials Research Society Symposium Proceedings, vol. 219

citation

Stevens, K. S.; Johnson, N. M. Measurement of intrinsic stress in a-Si:H thin films deposited in a remote hydrogen plasma reactor. Amorphous Silicon Technology--1991, Materials Research Society Symposium Proceedings, vol. 219, edited by P. C. Taylor, M. J. Thompson, P. G. LeComber, Y. Hamakawa, and A. Madan. Warrendale, PA: Materials Research Society; 1991; 715-720.