Deposition of a-Si:H thin films with a remote hydrogen plasma

• Amorphous Silicon Technology--1989, Materials Research Society Symposium Proceedings, Vol. 149

citation

N. M. Johnson, J. Walker, C. M. Doland, K. Winer, and R. A. Street, "Deposition of a-Si:H thin films with a remote hydrogen plasma,” Amorphous Silicon Technology--1989 (Materials Research Society, Pittsburgh, PA, 1989), eds. A. Madan, M. J. Thompson, P. C. Taylor, Y. Hamakawa, and P. G. LeComber, Materials Research Society Symposium Proceedings, Vol. 149, pp. 39-43.