Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma

• Applied Physics Letters

citation

N. M. Johnson, J. Walker, C. M. Doland, K. Winer, and R. A. Street, "Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma,” Applied Physics Letters, Vol. 54, No. 19, pp. 1872-1874 (May 8, 1989).