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Analysis of implanted boron profiles across the Si-SiO2 interface by secondary ion mass spectrometry

 
 
citation

V. R. Deline, N. M. Johnson, and L. A. Crystal, "Analysis of implanted boron profiles across the Si-SiO2 interface by secondary ion mass spectrometry," eds. J. E. E. Baglin, D. R. Campbell, and W. K. Chu, Proceedings of Materials Research Society Symposium on Thin Films and Interfaces II; 1983 November 14-17; Boston. New York: Elsevier Science Publishing Co., Inc; 1984; Vol. 25: pp. 649-654.