Analysis of implanted boron profiles across the Si-SiO2 interface by secondary ion mass spectrometry

• Thin Films and Interfaces II, Materials Research Society Symposium Proceedings, vol. 25

citation

V. R. Deline, N. M. Johnson, and L. A. Crystal, "Analysis of implanted boron profiles across the Si-SiO2 interface by secondary ion mass spectrometry," eds. J. E. E. Baglin, D. R. Campbell, and W. K. Chu, Proceedings of Materials Research Society Symposium on Thin Films and Interfaces II; 1983 November 14-17; Boston. New York: Elsevier Science Publishing Co., Inc; 1984; Vol. 25: pp. 649-654.