homeresources & publications › processing and properties of cw laser-recrystallized silicon films on amorphous substrates

TECHNICAL PUBLICATIONS:

Processing and properties of CW laser-recrystallized silicon films on amorphous substrates

 
 
citation

N. M. Johnson, D. K. Biegelsen, and M. D. Moyer, "Processing and properties of CW laser-recrystallized silicon films on amorphous substrates," Laser and Electron-Beam Solid Interactions and Materials Processing (Elsevier, New York, 1981), eds. J. F. Gibbons, L. D. Hess, and T. W. Sigmon, pp. 463-470.