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TECHNICAL PUBLICATIONS:
Characteristic defects at the Si-SiO2 interface
- The Physics of MOS Insulators
citation
N. M. Johnson, D. K. Biegelsen, and M. D. Moyer, "Characteristic defects at the Si-SiO2 interface," The Physics of MOS Insulators (Pergamon Press, New York, 1980), eds. G. Lucovsky, S. T. Pantelides, and F. L. Galeener, pp. 311-315.
PARC authors
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