High-resolution scanning electron-beam annealing of ion-implanted silicon

• Applied Physics Letters

citation

K. N. Ratnakumar, R. F. W. Pease, D. J. Bartelink, N. M. Johnson, and J. D. Meindl, "High-resolution scanning electron-beam annealing of ion-implanted silicon," Applied Physics Letters, Vol. 35, pp. 463-466 (1979).