PROFILE:
Dave Biegelsen
David was a charter member of Xerox PARC and is currently a Research Fellow. His fields of expertise include acousto-optic interactions, electron spin resonance and fundamental aspects of disordered semiconductors, laser-induced thin-film crystallization, scanning tunneling microscopy, heteroepitaxial growth, and new fabrication methods, design and use of complex "smart matter" systems.
One of his projects -- which exemplified the fabrication and programming of smart matter -- involved moving paper precisely, using arrays of analog sensors and computer-actuated air jets fabricated in printed circuit board technology. The system consists of hundreds of agents which can each sense, act and compute locally, yet work together with minimal global information to provide precise, coherent behaviors. More recent work has involved similar aggregations of electro-physical agents to allow parallel, redundant printing systems to be composed in a hypermodular fashion.
David holds over 100 US patents. He is a Fellow of the APS and has been an Editorial Board Member of Applied Physics Letters and Divisional Associate Editor of Physical Review Letters. He thrives on learning new concepts and using them in novel ways.
PARC publications
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2011
Integrated parallel printing systems with hypermodular architecture
IS&T-SPIE Electronic Imaging
24 January 2011
2009
2001
IEEE Conference on Decision and Control 2001
4 December 2001
2000
Air-jet paper mover: an example of mesoscale MEMS
SPIE International Symposium on Micromachining and Microfabrication
19 September 2000
Motion control of macro-scale objects using large-area arrays of MEMS-like distributed manipulators
7th Mechatronics Forum International Conference
6 September 2000
Distributed allocation using analog market wire computation and communication.
Mechatronics 2000
6 September 2000
1999
Paper transport using modulated air jet arrays
International Conference on Digital Printing Technologies
1 November 1999
Cultural repulsion or missing media?
Art and Innovation; the Xerox PARC Artist-in-Residence Program
1 August 1999
1996
Document scanning with page-sized amorphous silicon sensor arrays
OSA 1996 Symposium on Optics & Imaging in the Information Age
21 October 1996
Physical Review Letters
8 April 1996
1995
International Symposium on Atomically Controlled Surfaces and Interfaces
12 October 1995
Large format A-Si:H 2 dimensional arrays as imaging devices
IEEE Workshop on CCDS and Advanced Image Sensors
20 April 1995
1994
Self-limiting oxidation for fabricating sub-5 nm silicon nanowires
Applied Physics Letters
14 March 1994
1993
Self-limiting oxidation of Si nano-wires
Journal of Vacuum Science and Technology B
November/December 1993
Silicon quantum wires -- oxidation and transport studies
Microcrystalline Semiconductors -- Materials Science and Devices, Materials Research Society Symposium Proceedings
1993
Fabrication of Si nanostructures for light emission study
Optical Properties of Low Dimensional Silicon Structures
1993
1992
Fabrication of Si nanostructures for light emission study
Journal of Vacuum Science and Technology B
November/December 1992
1985
Native defects at the Si/SiO2 interface-amorphous silicon revisited
Applications of Surface Science
1985
Optically-heated zone crystal growth of silicon thin films on amorphous substrates
Silicon-on-Insulator: Its Technology and Applications
1985
Measurement of gap states in a-Si:H by photocapacitance spectroscopy
Proceedings of the 17th International Conference on the Physics of Semiconductors
1985
1984
Photodepopulation-induced ESR measurement of deep gap states in a-Si:H
Proceedings of AIP Conference on Optical Effects in Amorphous Semiconductors
August 1984
Defect reduction by tilted zone crystallization of patterned silicon films on fused silica
Energy Beam-Solid Interactions and Transient Thermal Processing, Materials Research Society Symposium Proceedings, vol. 23
1984
Electronic traps and Pb centers at the Si/SiO2 interface: band-gap energy distribution
Journal of Applied Physics
1984
1983
Laser-induced crystallization of silicon on bulk amorphous substrates: an overview
Proceedings of the MRS Symposium on Laser-Solid Interactions and Transient Thermal Processing of Materials
1983
Density of gap states of silicon grain boundaries determined by optical absorption
Applied Physics Letters
1983
Thin film transistors in CO2-laser crystallized silicon films on fused silica
Proceedings of the Materials Research Society Symposium on Laser-Solid Interactions and Transient Thermal Processing of Materials
1983
Correlated paramagnetic defects and electronic deep levels at the oxidized silicon surface
Proceedings of the International Conference on Insulating Films on Semiconductors
1983
1982
Single-crystal silicon transistors in laser-crystallized thin films on bulk glass
IEEE Electron Device Letters
1982
Deuterium passivation of grain-boundary dangling bonds in silicon thin films
Applied Physics Letters
1982
Laser and Electron-Beam Interactions with Solids
1982
1981
Properties of patterned and CW laser-crystallized silicon films on amorphous substrates
Insulating Films on Semiconductors
1981
Processing and properties of CW laser-recrystallized silicon films on amorphous substrates
Laser and Electron-Beam Solid Interactions and Materials Processing
1981
Low-temperature annealing and hydrogenation of defects at the Si-SiO2 interface
Journal of Vacuum Science and Technology
1981
Grain boundaries in p-n junction diodes fabricated in laser-recrystallized silicon thin films
Applied Physics Letters
1981
Deuterium at the Si-SiO2 interface detected by secondary ion mass spectrometry
Applied Physics Letters
1981
Laser-induced crystallization of silicon islands on amorphous substrates: multilayer structures
Applied Physics Letters
1981
Laser induced crystal growth of silicon islands on amorphous substrates
Laser and Electron-Beam Solid Interactions and Materials Processing
1981
1980
Scanning CW-laser-induced crystallization of silicon on amorphous substrates
Laser and Electron Beam Processing of Materials
1980
Surface-potential dependence of EPR centers at the Si/SiO2 interface
The Physics of MOS Insulators
1980
contact
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in the news
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Getting Personal: A Q&A with a PARC Pioneer Reflecting on "The Office of the Future" 40 Years Later
18 September 2010 | Scientific American
